Er<sup>3+</sup>-doped amorphous tellurite thin films
Ramanan, Pradeep; Gutwirth, Jan; Slang, Stanislav; Viswanathan, Anupama; Ghanawi, Taghrid; Starecki, Florent; Nazabal, Virginie; Roussey, Matthieu; Němec, Petr; Petit, Laeticia (2025)
Ramanan, Pradeep
Gutwirth, Jan
Slang, Stanislav
Viswanathan, Anupama
Ghanawi, Taghrid
Starecki, Florent
Nazabal, Virginie
Roussey, Matthieu
Němec, Petr
Petit, Laeticia
2025
JOURNAL OF THE AMERICAN CERAMIC SOCIETY
e20589
Julkaisun pysyvä osoite on
https://urn.fi/URN:NBN:fi:tuni-202508048017
https://urn.fi/URN:NBN:fi:tuni-202508048017
Kuvaus
Peer reviewed
Tiivistelmä
Radio-frequency (RF) magnetron sputtering was used to deposit amorphous tellurite thin films from glassy targets from TeO2–ZnO–Na2O/BaO/Bi2O3 system doped with 2.5 mol% of Er2O3. The impact of the sputtering power on the optical, luminescence, and structural properties of the films is discussed. The deposition process leads to amorphous and transparent films which emit light in the visible and near-infrared confirming the presence of Er3+ in the films’ network. Owing to their large refractive index and stability overtime, the Bi containing films are potential materials for integrated photonics and optical switches.
Kokoelmat
- TUNICRIS-julkaisut [22159]
