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Sulfonated Dopant-Free Hole-Transport Material Promotes Interfacial Charge Transfer Dynamics for Highly Stable Perovskite Solar Cells

Li, Rui; Liu, Maning; Matta, Sri Kasi; Hiltunen, Arto; Deng, Zhifeng; Wang, Cheng; Dai, Zhicheng; Russo, Salvy P.; Vivo, Paola; Zhang, Haichang (2021)

 
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Pb_S_bond_manuscript_R1_final_PV.pdf (1.910Mt)
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Li, Rui
Liu, Maning
Matta, Sri Kasi
Hiltunen, Arto
Deng, Zhifeng
Wang, Cheng
Dai, Zhicheng
Russo, Salvy P.
Vivo, Paola
Zhang, Haichang
2021

Advanced Sustainable Systems
2100244
This publication is copyrighted. You may download, display and print it for Your own personal use. Commercial use is prohibited.
doi:10.1002/adsu.202100244
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Julkaisun pysyvä osoite on
https://urn.fi/URN:NBN:fi:tuni-202211148354

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Peer reviewed
Tiivistelmä
<p>The integration of a functional group into dopant-free hole-transport materials (HTMs) to modify the perovskite|HTM interface has become a promising strategy for high-performance and stable perovskite solar cells (PSCs). In this work, a sulfonated phenothiazine-based HTM is reported, namely TAS, which consists of a butterfly structure with a readily synthesized N,​N-​bis[4-​(methylthio)​phenyl]​aniline side functional group. The interaction between TAS and perovskite via Pb–S bond induces a dipole moment that deepens the valence band of perovskite and thereby leads to enhanced open-circuit voltage in corresponding n-i-p PSCs. More importantly, the functionalization of perovskite surface via Pb–S bond promotes the hole extraction reaction while suppressing the interfacial non-radiative recombination, contributing to a 20–50% performance improvement compared to less- (4-​(methylthio)​-​N-​[4-​(methylthio)​phenyl]​aniline, DAS) or non-interacting (N,N-bis(4-methoxyphenyl)aniline, TAO) counterparts. Consequently, TAS-based PSCs exhibit superior device stability with a high PCE retention (>90% of the initial value) after 125 days of storage in the air.</p>
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Kalevantie 5
PL 617
33014 Tampereen yliopisto
oa[@]tuni.fi | Tietosuoja | Saavutettavuusseloste
 

 

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Kalevantie 5
PL 617
33014 Tampereen yliopisto
oa[@]tuni.fi | Tietosuoja | Saavutettavuusseloste