Si-CMOS compatible epsilon-near-zero metamaterial for two-color ultrafast all-optical switching

Abstract

Driven by the escalating demands of advanced technologies, developing integration strategies has kept pace with the realization of ultrafast components during the past two decades. Ultrafast all-optical switches enabled by artificial materials are considered at the forefront of the next generation of photonic integration for communications and high-volume data processing. Encouraged by these advancements, applications, and interest have increased toward all-optical switches based on epsilon-near-zero (ENZ) materials. However, some all-optical switches lack CMOS compatibility, require high energy activation, and are limited in switching speed and working wavelength. Here, we propose and demonstrate a multilayered ENZ metamaterial utilizing Si-compatible titanium nitride and indium-tin-oxide materials with two effective working wavelengths in the visible and near-infrared spectrum. This device enables switching time down to a few hundred femtoseconds utilizing minimal energy at the corresponding ENZ regions induced by intraband pumping. Our approach can enhance the adaptability of designing ENZ metamaterials for new hybrid integrated photonic components for low-power ultrafast all-optical terahertz modulation.