"Yadav, P." - Selaus tekijän mukaan TUNICRIS-julkaisut
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Aluminium oxide formation via atomic layer deposition using a polymer brush mediated selective infiltration approach
Snelgrove, M.; McFeely, C.; Mani-Gonzalez, P.G.; Lahtonen, K.; Lundy, R.; Hughes, G.; Valden, M.; McGlynn, E.; Yadav, P.; Saari, J.; Morris, M.A.; O'Connor, R. (2020)
articleArea selective deposition (ASD) is an emerging method for the patterning of electronic devices as it can significantly reduce processing steps in the industry. A potential ASD methodology uses infiltration of metal precursors ...