"ICP-RIE" - Selaus asiasanan mukaan Kandidaatintutkielmat

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    • Optimization of InP etching using inductively coupled plasma 

      Säe, Mira (2023)
      Kandidaatintyö
      The etching of semiconductor components is one of the most critical process steps in the manufacturing process of semiconductor devices, as the desired pattern can be transferred into the semiconductor wafer with lithography ...